Modeling of chemical vapor infiltration rate considering a pore size distribution

Noboru Yoshikawa, James W. Evans

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Abstract

To analyze chemical vapor infiltration (CVI) rates, a simulation model (PC model) was proposed, which is capable of considering difficulties of densification in the internal regions of porous bodies and the pore closure phenomena. In the model, a fictitious tapered pore is constructed based on the pore size distribution of the preform body, and variation of the pore shape during the process is calculated. For simulation study, fictitious tapered pores were constructed using different pore size distribution functions of Gaussian, δ-function, and flat distribution, and their shapes and characteristics were compared. In the case of the Gaussian flat distribution (large dispersion), the fraction of fine pores was large and these pores became closed near their mouths. Reconversion of temporal fictitious pore shape into the pore distribution function was attempted and the PC model was successfully applied to monitor variations in the pore size distributions during the CVI process.

Original languageEnglish
Pages (from-to)1485-1491
Number of pages7
JournalJournal of the American Ceramic Society
Volume85
Issue number6
DOIs
Publication statusPublished - 2002 Jun

ASJC Scopus subject areas

  • Ceramics and Composites
  • Materials Chemistry

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