TY - JOUR
T1 - Miniaturization of surface patterns by combination of contact etching lithography and multi-step shrinking of stretched polymer films
AU - Yabu, Hiroshi
AU - Shimomura, Masatsugu
PY - 2008
Y1 - 2008
N2 - We demonstrate here a novel pattern transferring method named "Contact Etching Lithography" onto stretched polymer films by using a solvent-swollen polydimethylsiloxane (PDMS) molds as a template. Furthermore, the transferred patterns can be miniaturized by thermal shrinking of the patterned stretched polymer film.
AB - We demonstrate here a novel pattern transferring method named "Contact Etching Lithography" onto stretched polymer films by using a solvent-swollen polydimethylsiloxane (PDMS) molds as a template. Furthermore, the transferred patterns can be miniaturized by thermal shrinking of the patterned stretched polymer film.
KW - Contact etching lithography
KW - Pattern miniaturization
KW - Stretched polymer films
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U2 - 10.1295/polymj.PJ2008022
DO - 10.1295/polymj.PJ2008022
M3 - Article
AN - SCOPUS:49149117227
VL - 40
SP - 534
EP - 537
JO - Polymer Journal
JF - Polymer Journal
SN - 0032-3896
IS - 6
ER -