Miniaturization of surface patterns by combination of contact etching lithography and multi-step shrinking of stretched polymer films

Hiroshi Yabu; Masatsugu Shimomura

doi:10.1295/polymj.PJ2008022

Miniaturization of surface patterns by combination of contact etching lithography and multi-step shrinking of stretched polymer films

Hiroshi Yabu, Masatsugu Shimomura

Advanced Institute for Materials Research (AIMR)

Research output: Contribution to journal › Article › peer-review

14 Citations (Scopus)

Abstract

We demonstrate here a novel pattern transferring method named "Contact Etching Lithography" onto stretched polymer films by using a solvent-swollen polydimethylsiloxane (PDMS) molds as a template. Furthermore, the transferred patterns can be miniaturized by thermal shrinking of the patterned stretched polymer film.

Original language	English
Pages (from-to)	534-537
Number of pages	4
Journal	Polymer Journal
Volume	40
Issue number	6
DOIs	https://doi.org/10.1295/polymj.PJ2008022
Publication status	Published - 2008

Keywords

Contact etching lithography
Pattern miniaturization
Stretched polymer films

ASJC Scopus subject areas

Polymers and Plastics
Materials Chemistry

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10.1295/polymj.PJ2008022

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abstract = "We demonstrate here a novel pattern transferring method named {"}Contact Etching Lithography{"} onto stretched polymer films by using a solvent-swollen polydimethylsiloxane (PDMS) molds as a template. Furthermore, the transferred patterns can be miniaturized by thermal shrinking of the patterned stretched polymer film.",

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KW - Pattern miniaturization

KW - Stretched polymer films

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