Microwave discharge plasma production with resonant cavity for EUV mask inspection tool

Saya Tashima, Masami Ohnishi, Waheed Hugrass, Keita Sugimoto, Masatugu Sakaguchi, Hodaka Osawa, Hiroaki Nishimura, Hiraku Matsukuma

Research output: Contribution to journalArticlepeer-review

Abstract

A microwave-discharge-produced plasma source was developed to generate 13.5nm extreme ultraviolet (EUV) radiation for application as a mask inspection tool. The EUV radiation of a system with a high Q-factor (>3900) resonant cavity and a solid-state oscillator was studied. The gas pressure and microwave power dependences on the EUV radiation for transverse-magnetic mode TM010 and transverse-electric mode TE111 were determined. For the solid-state oscillator, the efficiency of the EUV radiation over the input power was 5.8 times higher than that for a magnetron. EUV radiation of 10mW/(2φsr) was observed under a gas pressure of 5 Pa and microwave power of 400W. We expect that more EUV power and a smaller plasma is generated when a magnetic field is applied to confirm the plasma and a facility is operated with an improved system to cool an entire cavity.

Original languageEnglish
Article number126701
JournalJapanese journal of applied physics
Volume54
Issue number12
DOIs
Publication statusPublished - 2015 Dec
Externally publishedYes

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Fingerprint Dive into the research topics of 'Microwave discharge plasma production with resonant cavity for EUV mask inspection tool'. Together they form a unique fingerprint.

Cite this