Microstructures of chemical-vapour-deposited TiN films

Noboru Yoshikawa; Atsushi Kikuchi

doi:10.1557/proc-343-741

Microstructures of chemical-vapour-deposited TiN films

Noboru Yoshikawa, Atsushi Kikuchi

ENG - Metallurgy

Research output: Contribution to journal › Conference article › peer-review

1 Citation (Scopus)

Abstract

A gas mixture consisting of TiCl₄, H₂ and N₂ was fed into anexternally-heated steel tube, and TiN was deposited on the inner wall by CVD. Microstructures of the films were observed and their relationships with the preferred crystal orientations were studied. Distributions of the film growth rate and gas concentrations along the axial direction were calculated. By comparing the film microstructures with the calculated local deposition conditions, it is shown that formation of the films with (110) preferred orientation correlated with the conditions at high temperature and low partial pressure of TiCl₄ on the substrate.

Original language	English
Pages (from-to)	741-746
Number of pages	6
Journal	Materials Research Society Symposium - Proceedings
Volume	343
DOIs	https://doi.org/10.1557/proc-343-741
Publication status	Published - 1994
Event	Proceedings of the 1994 MRS Spring Meeting - San Francisco, CA, USA Duration: 1994 Apr 4 → 1994 Apr 8

ASJC Scopus subject areas

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

Access to Document

10.1557/proc-343-741

Cite this

@article{7a2b85c86ff14de49406a1defb04a34f,

title = "Microstructures of chemical-vapour-deposited TiN films",

abstract = "A gas mixture consisting of TiCl4, H2 and N2 was fed into anexternally-heated steel tube, and TiN was deposited on the inner wall by CVD. Microstructures of the films were observed and their relationships with the preferred crystal orientations were studied. Distributions of the film growth rate and gas concentrations along the axial direction were calculated. By comparing the film microstructures with the calculated local deposition conditions, it is shown that formation of the films with (110) preferred orientation correlated with the conditions at high temperature and low partial pressure of TiCl4 on the substrate.",

author = "Noboru Yoshikawa and Atsushi Kikuchi",

year = "1994",

doi = "10.1557/proc-343-741",

language = "English",

volume = "343",

pages = "741--746",

journal = "Materials Research Society Symposium - Proceedings",

issn = "0272-9172",

publisher = "Materials Research Society",

note = "Proceedings of the 1994 MRS Spring Meeting ; Conference date: 04-04-1994 Through 08-04-1994",

}

TY - JOUR

T1 - Microstructures of chemical-vapour-deposited TiN films

AU - Yoshikawa, Noboru

AU - Kikuchi, Atsushi

PY - 1994

Y1 - 1994

N2 - A gas mixture consisting of TiCl4, H2 and N2 was fed into anexternally-heated steel tube, and TiN was deposited on the inner wall by CVD. Microstructures of the films were observed and their relationships with the preferred crystal orientations were studied. Distributions of the film growth rate and gas concentrations along the axial direction were calculated. By comparing the film microstructures with the calculated local deposition conditions, it is shown that formation of the films with (110) preferred orientation correlated with the conditions at high temperature and low partial pressure of TiCl4 on the substrate.

AB - A gas mixture consisting of TiCl4, H2 and N2 was fed into anexternally-heated steel tube, and TiN was deposited on the inner wall by CVD. Microstructures of the films were observed and their relationships with the preferred crystal orientations were studied. Distributions of the film growth rate and gas concentrations along the axial direction were calculated. By comparing the film microstructures with the calculated local deposition conditions, it is shown that formation of the films with (110) preferred orientation correlated with the conditions at high temperature and low partial pressure of TiCl4 on the substrate.

UR - http://www.scopus.com/inward/record.url?scp=0028603197&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0028603197&partnerID=8YFLogxK

U2 - 10.1557/proc-343-741

DO - 10.1557/proc-343-741

M3 - Conference article

AN - SCOPUS:0028603197

VL - 343

SP - 741

EP - 746

JO - Materials Research Society Symposium - Proceedings

JF - Materials Research Society Symposium - Proceedings

SN - 0272-9172

T2 - Proceedings of the 1994 MRS Spring Meeting

Y2 - 4 April 1994 through 8 April 1994

ER -

Microstructures of chemical-vapour-deposited TiN films

Abstract

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this