Microstructures of chemical-vapour-deposited TiN films

Noboru Yoshikawa, Atsushi Kikuchi

Research output: Contribution to journalConference articlepeer-review

1 Citation (Scopus)


A gas mixture consisting of TiCl4, H2 and N2 was fed into anexternally-heated steel tube, and TiN was deposited on the inner wall by CVD. Microstructures of the films were observed and their relationships with the preferred crystal orientations were studied. Distributions of the film growth rate and gas concentrations along the axial direction were calculated. By comparing the film microstructures with the calculated local deposition conditions, it is shown that formation of the films with (110) preferred orientation correlated with the conditions at high temperature and low partial pressure of TiCl4 on the substrate.

Original languageEnglish
Pages (from-to)741-746
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Publication statusPublished - 1994
EventProceedings of the 1994 MRS Spring Meeting - San Francisco, CA, USA
Duration: 1994 Apr 41994 Apr 8

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


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