Microstructure and tribological properties of SiOx/DLC films grown by PECVD

Won Jae Yang, Tohru Sekino, Kwang Bo Shim, Koichi Niihara, Keun Ho Auh

Research output: Contribution to journalArticlepeer-review

44 Citations (Scopus)

Abstract

The structural modification of pure DLC films was attempted by the addition of Si-O structures into the DLC films. The chemical structures of SiOx/DLC films were investigated by FT-IR, XPS and Raman spectrometer and the microstructure by TEM. The SiOx/DLC films composing of two amorphous materials showed that amorphous silica were independently interconnected with amorphous hydrocarbon. The mechanical properties of SiOx/DLC films deposited at different bias voltages were discussed in terms of Raman parameters. The friction coefficient of SiOx/DLC films was obtained under the different applied loads and environmental conditions. The frictional behavior of SiOx/DLC films deposited at different bias voltages was investigated.

Original languageEnglish
Pages (from-to)128-135
Number of pages8
JournalSurface and Coatings Technology
Volume194
Issue number1
DOIs
Publication statusPublished - 2005 Apr 20

Keywords

  • Amorphous materials
  • Friction coefficient
  • Hardness
  • SiO/DLC

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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