Microstructure and tribological properties of SiOx/DLC films grown by PECVD

Won Jae Yang; Tohru Sekino; Kwang Bo Shim; Koichi Niihara; Keun Ho Auh

doi:10.1016/j.surfcoat.2004.05.023

Microstructure and tribological properties of SiO_x/DLC films grown by PECVD

Won Jae Yang, Tohru Sekino, Kwang Bo Shim, Koichi Niihara, Keun Ho Auh

Institute of Multidisciplinary Research for Advanced Materials (IMRAM)

Research output: Contribution to journal › Article › peer-review

49 Citations (Scopus)

Abstract

The structural modification of pure DLC films was attempted by the addition of Si-O structures into the DLC films. The chemical structures of SiO_x/DLC films were investigated by FT-IR, XPS and Raman spectrometer and the microstructure by TEM. The SiO_x/DLC films composing of two amorphous materials showed that amorphous silica were independently interconnected with amorphous hydrocarbon. The mechanical properties of SiO_x/DLC films deposited at different bias voltages were discussed in terms of Raman parameters. The friction coefficient of SiO_x/DLC films was obtained under the different applied loads and environmental conditions. The frictional behavior of SiO_x/DLC films deposited at different bias voltages was investigated.

Original language	English
Pages (from-to)	128-135
Number of pages	8
Journal	Surface and Coatings Technology
Volume	194
Issue number	1
DOIs	https://doi.org/10.1016/j.surfcoat.2004.05.023
Publication status	Published - 2005 Apr 20

Keywords

Amorphous materials
Friction coefficient
Hardness
SiO/DLC

ASJC Scopus subject areas

Chemistry(all)
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

Access to Document

10.1016/j.surfcoat.2004.05.023

Cite this

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title = "Microstructure and tribological properties of SiOx/DLC films grown by PECVD",

abstract = "The structural modification of pure DLC films was attempted by the addition of Si-O structures into the DLC films. The chemical structures of SiOx/DLC films were investigated by FT-IR, XPS and Raman spectrometer and the microstructure by TEM. The SiOx/DLC films composing of two amorphous materials showed that amorphous silica were independently interconnected with amorphous hydrocarbon. The mechanical properties of SiOx/DLC films deposited at different bias voltages were discussed in terms of Raman parameters. The friction coefficient of SiOx/DLC films was obtained under the different applied loads and environmental conditions. The frictional behavior of SiOx/DLC films deposited at different bias voltages was investigated.",

keywords = "Amorphous materials, Friction coefficient, Hardness, SiO/DLC",

author = "Yang, {Won Jae} and Tohru Sekino and Shim, {Kwang Bo} and Koichi Niihara and Auh, {Keun Ho}",

note = "Funding Information: This study was financially supported by the Korean Science and Engineering Foundation (KOSEF) through the Ceramic Processing Research Center (CPRC) and also by the Core University Program between Hanyang University, Korea and Osaka University, Japan. Copyright: Copyright 2008 Elsevier B.V., All rights reserved.",

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AU - Yang, Won Jae

AU - Sekino, Tohru

AU - Shim, Kwang Bo

AU - Niihara, Koichi

AU - Auh, Keun Ho

N1 - Funding Information: This study was financially supported by the Korean Science and Engineering Foundation (KOSEF) through the Ceramic Processing Research Center (CPRC) and also by the Core University Program between Hanyang University, Korea and Osaka University, Japan. Copyright: Copyright 2008 Elsevier B.V., All rights reserved.

PY - 2005/4/20

Y1 - 2005/4/20

N2 - The structural modification of pure DLC films was attempted by the addition of Si-O structures into the DLC films. The chemical structures of SiOx/DLC films were investigated by FT-IR, XPS and Raman spectrometer and the microstructure by TEM. The SiOx/DLC films composing of two amorphous materials showed that amorphous silica were independently interconnected with amorphous hydrocarbon. The mechanical properties of SiOx/DLC films deposited at different bias voltages were discussed in terms of Raman parameters. The friction coefficient of SiOx/DLC films was obtained under the different applied loads and environmental conditions. The frictional behavior of SiOx/DLC films deposited at different bias voltages was investigated.

AB - The structural modification of pure DLC films was attempted by the addition of Si-O structures into the DLC films. The chemical structures of SiOx/DLC films were investigated by FT-IR, XPS and Raman spectrometer and the microstructure by TEM. The SiOx/DLC films composing of two amorphous materials showed that amorphous silica were independently interconnected with amorphous hydrocarbon. The mechanical properties of SiOx/DLC films deposited at different bias voltages were discussed in terms of Raman parameters. The friction coefficient of SiOx/DLC films was obtained under the different applied loads and environmental conditions. The frictional behavior of SiOx/DLC films deposited at different bias voltages was investigated.

KW - Amorphous materials

KW - Friction coefficient

KW - Hardness

KW - SiO/DLC

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