Microstructure and tribological properties of SiOx/DLC films grown by PECVD

Won Jae Yang; Tohru Sekino; Kwang Bo Shim; Koichi Niihara; Keun Ho Auh

doi:10.1016/j.surfcoat.2004.05.023

Microstructure and tribological properties of SiO_x/DLC films grown by PECVD

Won Jae Yang, Tohru Sekino, Kwang Bo Shim, Koichi Niihara, Keun Ho Auh

Institute of Multidisciplinary Research for Advanced Materials (IMRAM)

Research output: Contribution to journal › Article › peer-review

44 Citations (Scopus)

Abstract

The structural modification of pure DLC films was attempted by the addition of Si-O structures into the DLC films. The chemical structures of SiO_x/DLC films were investigated by FT-IR, XPS and Raman spectrometer and the microstructure by TEM. The SiO_x/DLC films composing of two amorphous materials showed that amorphous silica were independently interconnected with amorphous hydrocarbon. The mechanical properties of SiO_x/DLC films deposited at different bias voltages were discussed in terms of Raman parameters. The friction coefficient of SiO_x/DLC films was obtained under the different applied loads and environmental conditions. The frictional behavior of SiO_x/DLC films deposited at different bias voltages was investigated.

Original language	English
Pages (from-to)	128-135
Number of pages	8
Journal	Surface and Coatings Technology
Volume	194
Issue number	1
DOIs	https://doi.org/10.1016/j.surfcoat.2004.05.023
Publication status	Published - 2005 Apr 20

Keywords

Amorphous materials
Friction coefficient
Hardness
SiO/DLC

ASJC Scopus subject areas

Chemistry(all)
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

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abstract = "The structural modification of pure DLC films was attempted by the addition of Si-O structures into the DLC films. The chemical structures of SiOx/DLC films were investigated by FT-IR, XPS and Raman spectrometer and the microstructure by TEM. The SiOx/DLC films composing of two amorphous materials showed that amorphous silica were independently interconnected with amorphous hydrocarbon. The mechanical properties of SiOx/DLC films deposited at different bias voltages were discussed in terms of Raman parameters. The friction coefficient of SiOx/DLC films was obtained under the different applied loads and environmental conditions. The frictional behavior of SiOx/DLC films deposited at different bias voltages was investigated.",

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AU - Auh, Keun Ho

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