Microstructure and preferred orientation of titanium nitride films prepared by laser CVD

Yansheng Gong, Rong Tu, Takashi Goto

Research output: Contribution to journalArticlepeer-review

18 Citations (Scopus)

Abstract

Titanium nitride (TiNx/: x = 0.96-1.12) films were prepared by laser chemical vapor deposition (LCVD) using tetrakis-diethylamidetitanium (TDEAT) and ammonia (NH3) as source materials. The effects of deposition conditions, mainly total gas pressure (Ptot). laser power (PL) and pre-heating temperature (Tpre), on the composition, microstructure and preferred orientation of TiNx films were investigated. The N/Ti ratios (x) in TiNx films decreased with increasing Ptot and increased with Tpre at Ptot < 400 Pa. The preferred orientation significantly depended on the T pre and PL. (111) orientation was obtained atT pre673 K and Ptot < 600 Pa, whereas (200) orientation appeared at Tpre > 673 K and Ptot < 600 Pa. The increase in PL caused the change from (200) to (111) orientation. With increasing Tpre, the TiNx films changed from a faceted texture with (111) orientation to a square texture with (200) orientation.

Original languageEnglish
Pages (from-to)2028-2034
Number of pages7
JournalMaterials Transactions
Volume50
Issue number8
DOIs
Publication statusPublished - 2009 Aug

Keywords

  • Laser chemical vapor deposition (lcvd)
  • Microstructure
  • Preferred orientation
  • Tetrakis-diethylamide-titanium (tdeat)
  • Tin films

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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