Microstructure and optical properties of amorphous TiO2-SiO2 composite films synthesized by helicon plasma sputtering

Xinrong Wang, Hiroshi Masumoto, Yoshihiro Someno, Toshio Hirai

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66 Citations (Scopus)


Composite films of TiO2-SiO2 have been deposited on Si(100) wafers and glass (BK7) substrates by helicon plasma sputtering at room temperature. The results of X-ray diffraction and high resolution transmission electron microscopic observation showed that all of the composite films have an amorphous structure. The observation of scanning electron microscopy exhibited that the surfaces of all of the composite films have dense smooth morphology. The refractive index and the transmittance of the composite films varied gradually in the whole composition range of the TiO2-SiO2 binary system. TiO2-SiO2 composite films exhibited a transmittance of more than 90% compared with that of the glass (BK7) substrate. The relationship between refractive index and TiO2 content for the composite films can be described using the Lorentz-Lorenz model

Original languageEnglish
Pages (from-to)105-109
Number of pages5
JournalThin Solid Films
Issue number1-2
Publication statusPublished - 1999 Jan 11


  • Optical properties
  • Plasma processing and deposition
  • Silicon oxide
  • Titanium oxide

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry


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