Microstructure and optical properties of amorphous TiO2-SiO2 composite films synthesized by helicon plasma sputtering

Xinrong Wang; Hiroshi Masumoto; Yoshihiro Someno; Toshio Hirai

doi:10.1016/S0040-6090(98)01007-4

Microstructure and optical properties of amorphous TiO₂-SiO₂ composite films synthesized by helicon plasma sputtering

Xinrong Wang, Hiroshi Masumoto, Yoshihiro Someno, Toshio Hirai

Advanced Interdisciplinary Research Division

Research output: Contribution to journal › Article › peer-review

61 Citations (Scopus)

Abstract

Composite films of TiO₂-SiO₂ have been deposited on Si(100) wafers and glass (BK7) substrates by helicon plasma sputtering at room temperature. The results of X-ray diffraction and high resolution transmission electron microscopic observation showed that all of the composite films have an amorphous structure. The observation of scanning electron microscopy exhibited that the surfaces of all of the composite films have dense smooth morphology. The refractive index and the transmittance of the composite films varied gradually in the whole composition range of the TiO₂-SiO₂ binary system. TiO₂-SiO₂ composite films exhibited a transmittance of more than 90% compared with that of the glass (BK7) substrate. The relationship between refractive index and TiO₂ content for the composite films can be described using the Lorentz-Lorenz model

Original language	English
Pages (from-to)	105-109
Number of pages	5
Journal	Thin Solid Films
Volume	338
Issue number	1-2
DOIs	https://doi.org/10.1016/S0040-6090(98)01007-4
Publication status	Published - 1999 Jan 11

Keywords

Optical properties
Plasma processing and deposition
Silicon oxide
Titanium oxide

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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@article{36e74eb2d71f4735be0b61d657d1831f,

title = "Microstructure and optical properties of amorphous TiO2-SiO2 composite films synthesized by helicon plasma sputtering",

abstract = "Composite films of TiO2-SiO2 have been deposited on Si(100) wafers and glass (BK7) substrates by helicon plasma sputtering at room temperature. The results of X-ray diffraction and high resolution transmission electron microscopic observation showed that all of the composite films have an amorphous structure. The observation of scanning electron microscopy exhibited that the surfaces of all of the composite films have dense smooth morphology. The refractive index and the transmittance of the composite films varied gradually in the whole composition range of the TiO2-SiO2 binary system. TiO2-SiO2 composite films exhibited a transmittance of more than 90% compared with that of the glass (BK7) substrate. The relationship between refractive index and TiO2 content for the composite films can be described using the Lorentz-Lorenz model",

keywords = "Optical properties, Plasma processing and deposition, Silicon oxide, Titanium oxide",

author = "Xinrong Wang and Hiroshi Masumoto and Yoshihiro Someno and Toshio Hirai",

note = "Funding Information: A part of this work is supported by the Grant-in-Aid for Scientific Research (A) (no. 07405029) and the Grant-in-Aid for Scientific Research on Priority Areas (No. 08243102 from The Ministry of Education, Science, Sports and Culture, Government of Japan. E. Aoyagi and U. Hayasaka of the Institute for Materials Research, Tohoku University, are gratefully acknowledged for their assistance in the observation of TEM. X.W. also wishes to thank T. Kikuchi of Nisshin Steel Co. Ltd. for his experimental assistance.",

year = "1999",

month = jan,

day = "11",

doi = "10.1016/S0040-6090(98)01007-4",

language = "English",

volume = "338",

pages = "105--109",

journal = "Thin Solid Films",

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AU - Wang, Xinrong

AU - Masumoto, Hiroshi

AU - Someno, Yoshihiro

AU - Hirai, Toshio

N1 - Funding Information: A part of this work is supported by the Grant-in-Aid for Scientific Research (A) (no. 07405029) and the Grant-in-Aid for Scientific Research on Priority Areas (No. 08243102 from The Ministry of Education, Science, Sports and Culture, Government of Japan. E. Aoyagi and U. Hayasaka of the Institute for Materials Research, Tohoku University, are gratefully acknowledged for their assistance in the observation of TEM. X.W. also wishes to thank T. Kikuchi of Nisshin Steel Co. Ltd. for his experimental assistance.

PY - 1999/1/11

Y1 - 1999/1/11

N2 - Composite films of TiO2-SiO2 have been deposited on Si(100) wafers and glass (BK7) substrates by helicon plasma sputtering at room temperature. The results of X-ray diffraction and high resolution transmission electron microscopic observation showed that all of the composite films have an amorphous structure. The observation of scanning electron microscopy exhibited that the surfaces of all of the composite films have dense smooth morphology. The refractive index and the transmittance of the composite films varied gradually in the whole composition range of the TiO2-SiO2 binary system. TiO2-SiO2 composite films exhibited a transmittance of more than 90% compared with that of the glass (BK7) substrate. The relationship between refractive index and TiO2 content for the composite films can be described using the Lorentz-Lorenz model

AB - Composite films of TiO2-SiO2 have been deposited on Si(100) wafers and glass (BK7) substrates by helicon plasma sputtering at room temperature. The results of X-ray diffraction and high resolution transmission electron microscopic observation showed that all of the composite films have an amorphous structure. The observation of scanning electron microscopy exhibited that the surfaces of all of the composite films have dense smooth morphology. The refractive index and the transmittance of the composite films varied gradually in the whole composition range of the TiO2-SiO2 binary system. TiO2-SiO2 composite films exhibited a transmittance of more than 90% compared with that of the glass (BK7) substrate. The relationship between refractive index and TiO2 content for the composite films can be described using the Lorentz-Lorenz model

KW - Optical properties

KW - Plasma processing and deposition

KW - Silicon oxide

KW - Titanium oxide

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