Microstructure and electrochemical properties of PVD TiN, (Ti, Al) N-coated Ti-based bulk metallic glasses

F. X. Qin, G. Q. Xie, X. M. Wang, T. Wada, M. Song, K. Furuya, M. Yoshimura, M. Tsukamoto, A. Inoue

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)


In this study, the microstructure and electrochemical properties of PVD TiN and (Ti, Al) N coatings on Ti40Zr10Cu36Pd 14 bulk metallic glass were investigated. The microstructure of TiN or (Ti, Al) N coatings, the BMG substrate and the interface was investigated by highresolution transmission electron microscopy. The electrochemical behavior of PVD coatings on the Ti-based BMG was studied by measuring potentiodynamic polarization curves in Hanks' solution. HREM observation revealed that the sputtering TiN ((Ti, Al) N) coating consisted of cubic TiN ((Ti, Al) N) phase with a lattice parameter of 0.426 (0.422) nm in nanoscale. The polarization curves showed that the open circuit potential shifted to a more positive potential and the passive current density decreased due to the protective TiN or (Ti, Al) N coating.

Original languageEnglish
Pages (from-to)1313-1317
Number of pages5
JournalMaterials Transactions
Issue number6
Publication statusPublished - 2009 Jun


  • Bulk metallic glass
  • Corrosion resistance
  • Microstructure
  • Physical vapor deposition (PVD) coating

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


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