Micropattern of inorganic film prepared by uv-irradiation and heat treatment of polyalkylsilyne film

Akira Watanabe, Yoshinori Nagai, Minoru Matsuda

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

A micropattern of inorganic thin film was formed by heat treatment of a polyalkylsilyne film at 300 °C after UV irradiation with photomask. The Si-Si chain of spin-coated polyalkylsilyne film was photooxidized by UV irradiation with photomask in air. The XPS spectra showed that the Si-O-Si chain of the UV-irradiated part changed into SÌO2 upon heat treatment in vacuo. On the other hand, the heat treatment changed the masked part into an a-Si-like structure with low optical band gap. The micrograph demonstrated lines of the irradiated area and spaces of the masked area.

Original languageEnglish
Pages (from-to)L 452-L 454
JournalJapanese journal of applied physics
Volume34
Issue number4
DOIs
Publication statusPublished - 1995 Apr

Keywords

  • Heat treatment
  • Micropatterning
  • Optical band gap
  • Photooxidation
  • Polyalkylsilyne

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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