Micron-size optical waveguide for optoelectronic integrated circuit

Takahiko Nagata, Tsuyoshi Tanaka, Kouji Miyake, Hirokazu Kurotaki, Shin Yokoyama, Mitsumasa Koyanagi

Research output: Contribution to journalArticlepeer-review

24 Citations (Scopus)


Fundamental technologies for the optical interconnection in the VLSI chip have been developed by using conventional Si LSI technologies. The micron-size optical waveguide consisting of Si3N4 core and SiO2 cladding layers has been fabricated by low-pressure chemical vapor deposition (LPCVD) and atmospheric-pressure chemical vapor deposition (APCVD), respectively. The small lenses and the micron-size mirror which changes the light propagation direction from vertical to horizontal for the interlayer interconnection have also been fabricated.

Original languageEnglish
Pages (from-to)822-826
Number of pages5
JournalJapanese journal of applied physics
Issue number1
Publication statusPublished - 1994
Externally publishedYes


  • Microlens
  • Micromirror
  • Micron-size optical waveguide
  • Optical interconnection
  • Si LSI technologies

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)


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