Micron-size optical waveguide for optoelectronic integrated circuit

Takahiko Nagata, Tsuyoshi Tanaka, Kouji Miyake, Hirokazu Kurotaki, Shin Yokoyama, Mitsumasa Koyanagi

Research output: Contribution to journalArticle

24 Citations (Scopus)

Abstract

Fundamental technologies for the optical interconnection in the VLSI chip have been developed by using conventional Si LSI technologies. The micron-size optical waveguide consisting of Si3N4 core and SiO2 cladding layers has been fabricated by low-pressure chemical vapor deposition (LPCVD) and atmospheric-pressure chemical vapor deposition (APCVD), respectively. The small lenses and the micron-size mirror which changes the light propagation direction from vertical to horizontal for the interlayer interconnection have also been fabricated.

Original languageEnglish
Pages (from-to)822-826
Number of pages5
JournalJapanese journal of applied physics
Volume33
Issue number1
DOIs
Publication statusPublished - 1994 Jan 1

Keywords

  • Microlens
  • Micromirror
  • Micron-size optical waveguide
  • Optical interconnection
  • Si LSI technologies

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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  • Cite this

    Nagata, T., Tanaka, T., Miyake, K., Kurotaki, H., Yokoyama, S., & Koyanagi, M. (1994). Micron-size optical waveguide for optoelectronic integrated circuit. Japanese journal of applied physics, 33(1), 822-826. https://doi.org/10.1143/JJAP.33.822