Micron-size optical waveguide for optoelectronic integrated circuit

Takahiko Nagata; Tsuyoshi Tanaka; Kouji Miyake; Hirokazu Kurotaki; Shin Yokoyama; Mitsumasa Koyanagi

doi:10.1143/JJAP.33.822

Micron-size optical waveguide for optoelectronic integrated circuit

Takahiko Nagata, Tsuyoshi Tanaka, Kouji Miyake, Hirokazu Kurotaki, Shin Yokoyama, Mitsumasa Koyanagi

Research output: Contribution to journal › Article › peer-review

24 Citations (Scopus)

Abstract

Fundamental technologies for the optical interconnection in the VLSI chip have been developed by using conventional Si LSI technologies. The micron-size optical waveguide consisting of Si₃N₄ core and SiO₂ cladding layers has been fabricated by low-pressure chemical vapor deposition (LPCVD) and atmospheric-pressure chemical vapor deposition (APCVD), respectively. The small lenses and the micron-size mirror which changes the light propagation direction from vertical to horizontal for the interlayer interconnection have also been fabricated.

Original language	English
Pages (from-to)	822-826
Number of pages	5
Journal	Japanese journal of applied physics
Volume	33
Issue number	1
DOIs	https://doi.org/10.1143/JJAP.33.822
Publication status	Published - 1994
Externally published	Yes

Keywords

Microlens
Micromirror
Micron-size optical waveguide
Optical interconnection
Si LSI technologies

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

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10.1143/JJAP.33.822

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@article{2d748229ce2b410883cad14281c01c76,

title = "Micron-size optical waveguide for optoelectronic integrated circuit",

abstract = "Fundamental technologies for the optical interconnection in the VLSI chip have been developed by using conventional Si LSI technologies. The micron-size optical waveguide consisting of Si3N4 core and SiO2 cladding layers has been fabricated by low-pressure chemical vapor deposition (LPCVD) and atmospheric-pressure chemical vapor deposition (APCVD), respectively. The small lenses and the micron-size mirror which changes the light propagation direction from vertical to horizontal for the interlayer interconnection have also been fabricated.",

keywords = "Microlens, Micromirror, Micron-size optical waveguide, Optical interconnection, Si LSI technologies",

author = "Takahiko Nagata and Tsuyoshi Tanaka and Kouji Miyake and Hirokazu Kurotaki and Shin Yokoyama and Mitsumasa Koyanagi",

year = "1994",

doi = "10.1143/JJAP.33.822",

language = "English",

volume = "33",

pages = "822--826",

journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",

issn = "0021-4922",

publisher = "Japan Society of Applied Physics",

number = "1",

}

TY - JOUR

T1 - Micron-size optical waveguide for optoelectronic integrated circuit

AU - Nagata, Takahiko

AU - Tanaka, Tsuyoshi

AU - Miyake, Kouji

AU - Kurotaki, Hirokazu

AU - Yokoyama, Shin

AU - Koyanagi, Mitsumasa

PY - 1994

Y1 - 1994

N2 - Fundamental technologies for the optical interconnection in the VLSI chip have been developed by using conventional Si LSI technologies. The micron-size optical waveguide consisting of Si3N4 core and SiO2 cladding layers has been fabricated by low-pressure chemical vapor deposition (LPCVD) and atmospheric-pressure chemical vapor deposition (APCVD), respectively. The small lenses and the micron-size mirror which changes the light propagation direction from vertical to horizontal for the interlayer interconnection have also been fabricated.

AB - Fundamental technologies for the optical interconnection in the VLSI chip have been developed by using conventional Si LSI technologies. The micron-size optical waveguide consisting of Si3N4 core and SiO2 cladding layers has been fabricated by low-pressure chemical vapor deposition (LPCVD) and atmospheric-pressure chemical vapor deposition (APCVD), respectively. The small lenses and the micron-size mirror which changes the light propagation direction from vertical to horizontal for the interlayer interconnection have also been fabricated.

KW - Microlens

KW - Micromirror

KW - Micron-size optical waveguide

KW - Optical interconnection

KW - Si LSI technologies

UR - http://www.scopus.com/inward/record.url?scp=0028312703&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0028312703&partnerID=8YFLogxK

U2 - 10.1143/JJAP.33.822

DO - 10.1143/JJAP.33.822

M3 - Article

AN - SCOPUS:0028312703

VL - 33

SP - 822

EP - 826

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

SN - 0021-4922

IS - 1

ER -

Micron-size optical waveguide for optoelectronic integrated circuit

Abstract

Keywords

ASJC Scopus subject areas

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