Abstract
Fundamental technologies for the optical interconnection in the VLSI chip have been developed by using conventional Si LSI technologies. The micron-size optical waveguide consisting of Si3N4 core and SiO2 cladding layers has been fabricated by low-pressure chemical vapor deposition (LPCVD) and atmospheric-pressure chemical vapor deposition (APCVD), respectively. The small lenses and the micron-size mirror which changes the light propagation direction from vertical to horizontal for the interlayer interconnection have also been fabricated.
| Original language | English |
|---|---|
| Pages (from-to) | 822-826 |
| Number of pages | 5 |
| Journal | Japanese journal of applied physics |
| Volume | 33 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - 1994 Jan 1 |
Keywords
- Microlens
- Micromirror
- Micron-size optical waveguide
- Optical interconnection
- Si LSI technologies
ASJC Scopus subject areas
- Engineering(all)
- Physics and Astronomy(all)
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Cite this
Nagata, T., Tanaka, T., Miyake, K., Kurotaki, H., Yokoyama, S., & Koyanagi, M. (1994). Micron-size optical waveguide for optoelectronic integrated circuit. Japanese journal of applied physics, 33(1), 822-826. https://doi.org/10.1143/JJAP.33.822