Microhardness of non-stoichiometric TiCx, plates prepared by chemical vapour deposition

C. C. Jiang, T. Goto, T. Hirai

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14 Citations (Scopus)

Abstract

The relationship between Vickers' microhardness and non-stoichiometric composition of titanium carbide (TiCx) plates was investigated. TiCx plates having a composition range from x = 0.57 to 1.0 were prepared by chemical vapour deposition using TiCl4, CCl4 and H2 as source gases at total gas pressures (Ptot) of 4 and 40 kPa and deposition temperatures (Tdep) of 1573 to 1873 K. The microhardness increased from about 2000 to 3000 kg mm-2 with increasing x independent of Tdep, but this change depended on Ptot. The TiCx plates prepared at Ptot = 4 kPa showed slightly higher hardness values than those prepared at Ptot = 40 kPa. The relationship between Ptot and microhardness was explained by the difference in grain sizes. The grain sizes of deposits prepared at Ptot = 4kPa were about half the size of those prepared at Ptot = 40 kPa.

Original languageEnglish
Pages (from-to)339-346
Number of pages8
JournalJournal of the Less-Common Metals
Volume163
Issue number2
DOIs
Publication statusPublished - 1990 Oct 5

ASJC Scopus subject areas

  • Engineering(all)

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