Microfocusing of 82 keV x rays with a sputtered-sliced Fresnel zone plate

M. Awaji, Y. Suzuki, A. Takeuchi, H. Takano, N. Kamijo, M. Yasumoto, Y. Terada, S. Tamura

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

An approach for microfocusing of 82 keV x-rays with a sputtered-sliced Fresnel zone plate (SS-FZP) was described. The SS-FZP consisted of 50 layers of alternative copper layer and aluminum layer deposited on a gold core. The measured distance between the SS-FZP and the focal point was 1.64 m at 82 keV. The achieved beam size was found to be 1.1 μm in vertical and 1.3 μm in horizontal directions while the measured flux density was 7×10 5 (photons/s/μm2).

Original languageEnglish
Pages (from-to)4948-4949
Number of pages2
JournalReview of Scientific Instruments
Volume74
Issue number11
DOIs
Publication statusPublished - 2003 Nov

ASJC Scopus subject areas

  • Instrumentation

Fingerprint Dive into the research topics of 'Microfocusing of 82 keV x rays with a sputtered-sliced Fresnel zone plate'. Together they form a unique fingerprint.

  • Cite this

    Awaji, M., Suzuki, Y., Takeuchi, A., Takano, H., Kamijo, N., Yasumoto, M., Terada, Y., & Tamura, S. (2003). Microfocusing of 82 keV x rays with a sputtered-sliced Fresnel zone plate. Review of Scientific Instruments, 74(11), 4948-4949. https://doi.org/10.1063/1.1606116