Microfabrication of miniature aperture at the apex of SiO2 tip on silicon cantilever for near-field scanning optical microscopy

Phan Ngoc Minh, Takahito Ono, Masayoshi Esashi

Research output: Contribution to journalConference articlepeer-review

19 Citations (Scopus)

Abstract

In this paper we present a novel batch fabrication method of a miniature aperture at the apex of SiO2 tip on a Si cantilever for near-field scanning optical microscopy (NSOM). The Si cantilever was microfabricated from Si(100) wafer, a SiO2 pyramidal tip was formed near the end of the Si cantilever by thermal oxidation at low temperature. Due to the effect of locally compressive intrinsic stress, the thermal silicon oxide at the apex is thinner than that at the side wall of the pyramidal etch pit. Thus, a tiny aperture can be created at the apex of SiO2 tip by selective etching the SiO2 in buffered-HF (BHF) solution. Using this etching method aperture size ranging from 150 to 500 nm have been successfully fabricated. By optimizing the SiO2 etching time and oxidation condition, sub-100 nm size aperture or aperture array are feasible using the fabrication method. The fabricated probe was combined to an atomic force microscope (AFM) as an AFM/NSOM probe. The AFM in contact mode and corresponding NSOM images of several surfaces were simultaneously obtained. By optimizing the structure of the cantilever we expect to produce a high frequency probe for NSOM, NSOM based data storage and lithography.

Original languageEnglish
Pages (from-to)163-169
Number of pages7
JournalSensors and Actuators, A: Physical
Volume80
Issue number2
DOIs
Publication statusPublished - 2000 Mar 10
Event12th IEEE International Workshop on Micro Electro Mechanical Systems (MEMS-99) - Orlando, FL, USA
Duration: 1999 Jan 171999 Jan 21

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Electrical and Electronic Engineering

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