Microelectron field emitter array with focus lenses for multielectron beam lithography based on silicon on insulator wafer

Phan Ngoc Minh, Takahito Ono, Nobuyuki Sato, Hidenori Mimura, Masayoshi Esashi

Research output: Contribution to journalArticlepeer-review

21 Citations (Scopus)

Abstract

The device concept, fabrication, emission and focussing characteristics of the microelectron field emitter array with the focus lenses were discussed. The device was aimed at low-energy, multielectron beam lithography application. The device was also monolithically fabricated on conventional silicon on insulator (SOI) wafer using the Si microfabrication process. The emitter-lens leak current and the emitter-gate were found to be less then 1% compared with the emission current.

Original languageEnglish
Pages (from-to)1273-1276
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume22
Issue number3
Publication statusPublished - 2004 May 1

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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