Microbubble: Fundamental properties and application for semiconductor cleaning

Masayoshi Takahashi

doi:10.2493/jjspe.83.636

Microbubble: Fundamental properties and application for semiconductor cleaning

Research output: Contribution to journal › Review article › peer-review

Original language	English
Pages (from-to)	636-640
Number of pages	5
Journal	Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Volume	83
Issue number	7
DOIs	https://doi.org/10.2493/jjspe.83.636
Publication status	Published - 2017
Externally published	Yes

Keywords

Cleaning
Hydroxyl radicals
Microbubble
Semiconductor
Zeta potential

ASJC Scopus subject areas

Mechanical Engineering

Access to Document

10.2493/jjspe.83.636

Cite this

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title = "Microbubble: Fundamental properties and application for semiconductor cleaning",

keywords = "Cleaning, Hydroxyl radicals, Microbubble, Semiconductor, Zeta potential",

author = "Masayoshi Takahashi",

year = "2017",

doi = "10.2493/jjspe.83.636",

language = "English",

volume = "83",

pages = "636--640",

journal = "Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering",

issn = "0912-0289",

publisher = "Japan Society for Precision Engineering",

number = "7",

}

TY - JOUR

T1 - Microbubble

T2 - Fundamental properties and application for semiconductor cleaning

AU - Takahashi, Masayoshi

PY - 2017

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KW - Hydroxyl radicals

KW - Microbubble

KW - Semiconductor

KW - Zeta potential

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M3 - Review article

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SP - 636

EP - 640

JO - Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering

JF - Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering

SN - 0912-0289

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Microbubble: Fundamental properties and application for semiconductor cleaning

Keywords

ASJC Scopus subject areas

Access to Document

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