Microbubble: Fundamental properties and application for semiconductor cleaning

Research output: Contribution to journalReview article

Original languageEnglish
Pages (from-to)636-640
Number of pages5
JournalSeimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Volume83
Issue number7
DOIs
Publication statusPublished - 2017 Jan 1
Externally publishedYes

Keywords

  • Cleaning
  • Hydroxyl radicals
  • Microbubble
  • Semiconductor
  • Zeta potential

ASJC Scopus subject areas

  • Mechanical Engineering

Cite this