Micro-optical components based on silicon mold technology

Yigui Li, Sasaki Minoru, Hane Kazuhiro

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

Two micro-optical components fabricated by silicon molds are described. One component is micro-cavity in micro-scales and the other is sub-micron grating with a pitch of 200nm. The feasibility of two methods for the micro-fabrication of the silicon molds is investigated: one method is for making hundreds of micrometer size silicon molds by using conventional photolithography and deep reactive ion etching (Deep-RIE) technique combined with wet etching; and the other is for fabricating sub-micron grating molds by using electron beam lithography and fast atom beam etching (FAB). Sub-wavelength structure is successfully transferred from silicon mold to poly-methyl methacrylate (PMMA) material. The yield and repeatability of the original master are quite good. This technique can also be used to fabricate other micro-scale structures.

Original languageEnglish
Pages (from-to)545-552
Number of pages8
JournalOptics and Lasers in Engineering
Volume41
Issue number3
DOIs
Publication statusPublished - 2004 Mar 1

Keywords

  • Deep-RIE
  • FAB
  • Replication
  • Silicon mold

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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