Metalorganic Chemical Vapor Deposition of HfO2 Films through the Alternating Supply of Tetrakis(1-methoxy-2-methyl-2-propoxy)-Hafnium and Remote-Plasma Oxygen

Sadayoshi Horii, Kazuhiko Yamamoto, Masayuki Asai, Hironobu Miya, Masaaki Niwa

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21 Citations (Scopus)

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