Metal-insulator transition of valence-controlled VO2 thin film prepared by RF magnetron sputtering using oxygen radical

Takaaki Suetsugu, Yuichi Shimazu, Takashi Tsuchiya, Masaki Kobayashi, Makoto Minohara, Enju Sakai, Koji Horiba, Hiroshi Kumigashira, Tohru Higuchi

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

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Engineering & Materials Science

Physics & Astronomy