Abstract
The electronic state of a KCl/Cu(0 0 1) interface was investigated using the Cl K-edgc near-edge X-ray absorption fine structure (NEXAPS). A pre-peak observed on the bulk edge onset of thin KC1 films has a similar feature to the peak at a LiCl/ Cu(0 0 1) interface, which originates from the metal induced gap state (MIGS). The present result indicates that the MIGS is formed universally at alkali halide/metal interfaces. The decay length of MIGS to an insulator differs from each other, mainly due to the difference in the band gap energy of alkali halide.
| Original language | English |
|---|---|
| Pages (from-to) | 495-498 |
| Number of pages | 4 |
| Journal | Applied Surface Science |
| Volume | 237 |
| Issue number | 1-4 |
| DOIs | |
| Publication status | Published - 2004 Oct 15 |
| Externally published | Yes |
Keywords
- Alkali halides
- Metal-insulator interfaces
- Near-edge extended X-ray absorption fine structure
ASJC Scopus subject areas
- Chemistry(all)
- Condensed Matter Physics
- Physics and Astronomy(all)
- Surfaces and Interfaces
- Surfaces, Coatings and Films
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Cite this
Kiguchi, M., Yoshikawa, G., Ikeda, S., & Saiki, K. (2004). Metal induced gap states at alkali halide/metal interface. Applied Surface Science, 237(1-4), 495-498. https://doi.org/10.1016/j.apsusc.2004.06.127