Metal induced gap states at alkali halide/metal interface

Manabu Kiguchi, Genki Yoshikawa, Susumu Ikeda, Koichiro Saiki

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

The electronic state of a KCl/Cu(0 0 1) interface was investigated using the Cl K-edgc near-edge X-ray absorption fine structure (NEXAPS). A pre-peak observed on the bulk edge onset of thin KC1 films has a similar feature to the peak at a LiCl/ Cu(0 0 1) interface, which originates from the metal induced gap state (MIGS). The present result indicates that the MIGS is formed universally at alkali halide/metal interfaces. The decay length of MIGS to an insulator differs from each other, mainly due to the difference in the band gap energy of alkali halide.

Original languageEnglish
Pages (from-to)495-498
Number of pages4
JournalApplied Surface Science
Volume237
Issue number1-4
DOIs
Publication statusPublished - 2004 Oct 15
Externally publishedYes

Keywords

  • Alkali halides
  • Metal-insulator interfaces
  • Near-edge extended X-ray absorption fine structure

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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