Metal-Assisted Chemical Etching Method Subjected to Micro/Nano Device Fabrication

Nguyen Van Toan, Xiaoyue Wang, Naoki Inomata, Masaya Toda, Ioana Voiculescu, Takahito Ono

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

This work presents the metal-assisted chemical etching (MACE) technique along with applications of this technique in micro/nano systems. In this research the MACE technique was used for the fabrication of simple and complex microelectromechanical systems (MEMS) structure such as; micro-cantilever beam and capacitive silicon resonator respectively. Micro-cantilever beam with resonant frequency of 262 kHz and quality factor of 8100 was successfully fabricated. Nano gaps with 250 nm-width and 7 μm-height together with resonator structure have been successfully produced. The resonant peak of the fabricated resonator was found at 81.4 MHz with quality factor of 4000 and motional resistance of 89 kω.

Original languageEnglish
Title of host publication2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages1639-1642
Number of pages4
ISBN (Electronic)9781728120072
DOIs
Publication statusPublished - 2019 Jun
Event20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII - Berlin, Germany
Duration: 2019 Jun 232019 Jun 27

Publication series

Name2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII

Conference

Conference20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII
CountryGermany
CityBerlin
Period19/6/2319/6/27

Keywords

  • Metal-assisted chemical etching
  • and cantilever
  • capacitive silicon resonator

ASJC Scopus subject areas

  • Process Chemistry and Technology
  • Spectroscopy
  • Electrical and Electronic Engineering
  • Mechanical Engineering
  • Electronic, Optical and Magnetic Materials
  • Control and Optimization
  • Instrumentation

Fingerprint Dive into the research topics of 'Metal-Assisted Chemical Etching Method Subjected to Micro/Nano Device Fabrication'. Together they form a unique fingerprint.

  • Cite this

    Toan, N. V., Wang, X., Inomata, N., Toda, M., Voiculescu, I., & Ono, T. (2019). Metal-Assisted Chemical Etching Method Subjected to Micro/Nano Device Fabrication. In 2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII (pp. 1639-1642). [8808663] (2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/TRANSDUCERS.2019.8808663