Mechanism for homogenizing electrical properties of semi-insulating GaAs during ingot annealing

Maki Suemitsu, Koji Terada, Masaaki Nishijima, Nobuo Miyamoto

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

Concentrations of total ionized point defects, neutral and ionized EL2, carbon acceptor, and other shallow donor and acceptor levels in as-grown and as-annealed semi-insulating GaAs crystals were characterized using nuclear magnetic resonance, multiwavelength near-infrared photoabsorption, and Fourier-transformed infrared photoabsorption. In as-grown crystals, shallow donors (XD) and acceptors (XA) of about 2×10 15 cm-3 concentration were found to exist. The net donor concentration (NXD - NXA) of these levels showed an excellent positive correlation with the carbon acceptor in its distribution within the wafer, implying the donor's carbon-acceptor-related origin. An anneal at 850 °C for 24 h diminished these levels. By regarding the intrinsic donor as VAs, the improvement in electrical uniformity during ingot annealing is explained in terms of an annihilation of both intrinsic acceptors and precursors for SiAs acceptors.

Original languageEnglish
Pages (from-to)2594-2598
Number of pages5
JournalJournal of Applied Physics
Volume70
Issue number5
DOIs
Publication statusPublished - 1991

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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