Abstract
A model of the kink phenomena in InAlAs/InGaAs heterojunction electron mobility transistors (HEMT) was investigated using two dimensional numerical device simulation. The analysis of electron and hole density in the side-etched region led to the development of the kink model. The electron density of the model in the channel of the side-etched region is reduced by surface states. Once the holes are generated by impact ionization accumulating in the source-to-gate side-etched-ratio, the potential profile is modified and the electron density is recovered. Keeping the electron density in the side-etched region high or short is an effective way of eliminating the kink.
Original language | English |
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Pages (from-to) | 365-368 |
Number of pages | 4 |
Journal | Conference Proceedings - International Conference on Indium Phosphide and Related Materials |
Publication status | Published - 1997 Jan 1 |
Externally published | Yes |
Event | Proceedings of the 1997 International Conference on Indium Phosphide and Related Materials - Cape Cod, MA, USA Duration: 1997 May 11 → 1997 May 15 |
ASJC Scopus subject areas
- Materials Science(all)
- Physics and Astronomy(all)