Mechanical quality factor enhancement in a silicon micromechanical resonator by low-damage process using neutral beam etching technology

Nguyen Van Toan, Tomohiro Kubota, Halubai Sekhar, Seiji Samukawa, Takahito Ono

Research output: Contribution to journalArticle

25 Citations (Scopus)

Abstract

The fabrication and evaluation of silicon micromechanical resonators using neutral beam etching (NBE) technology is presented. An etching technique based on a low energy neutral beam of Cl2/F2/O2 is introduced for making nano-trench patterns on 5 μ

Original languageEnglish
Article number085005
JournalJournal of Micromechanics and Microengineering
Volume24
Issue number8
DOIs
Publication statusPublished - 2014 Aug 1

Keywords

  • deep reactive ion etching
  • neutral beam etching technology
  • silicon micromechanical resonator
  • silicon on insulator

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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