Mechanical properties of sputtered Ti thin films (A TEM observation of microstructures of Ti thin films)

Hirofumi Ogawa, Shinji Kaneko, Kiyoteru Suzuki, Masumi Saka

Research output: Contribution to journalArticlepeer-review


The effect of sputtering gas (Ar gas) pressure on the growth and the structure of Ti thin film membranes of 0.3-0.4 μm thickness, microfabricated by magnetron sputtering, has been studied by transmission electron microscopy. In the present investigation, sputtering gas pressure was varied from 0.2 Pa to 2.0 Pa. The as-deposited Ti films showed very fine structures. The Ti films deposited at 0.2-1.1 Pa had hcp structures with preferred orientation. On the other hand, the Ti films deposited at 2.0 Pa appear to be a mixture of a random hcp structure and a cubic structure. The Ti films deposited at lower Ar gas pressures had dense structures with smooth flat surfaces, however, the rough surfaces of Ti films were promoted by elevated Ar gas pressures. Shadowing played a very important role in the coating growth of the Ti films. The lower tensile strength values of Ti films deposited at higher Ar gas pressures can be explained in terms of shadowing.

Original languageEnglish
Pages (from-to)1279-1284
Number of pages6
JournalNippon Kikai Gakkai Ronbunshu, A Hen/Transactions of the Japan Society of Mechanical Engineers, Part A
Issue number8
Publication statusPublished - 2002 Aug


  • Grain size
  • Microstructure
  • Nano-diffraction
  • Reliability
  • Residual stress
  • Sputtering
  • TEM
  • Tensile properties
  • Thin film
  • Titanium

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering


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