Mechanical properties and residual stress in AlN films prepared by ion beam assisted deposition

Yoshihisa Watanabe, Nobuaki Kitazawa, Yoshikazu Nakamura, Chunliang Li, Tohru Sekino, Koichi Niihara

Research output: Contribution to journalConference article

14 Citations (Scopus)

Abstract

The synthesis of AlN films with varied microstructures using nitrogen ion beam assisted deposition was described. The effect of ion beam energy on the mechanical properties and residual stresses of the films was studied under energies from 0.2 to 1.5 keV. A nano-indentation method revealed softening and plasticity in the films. The optical cantilever system showed a relaxation of residual stress. However, the films were in a compressive stress state independently from the beam energy. Granular structure films were found to be more easily relaxed than columnar structure films as a function of annealing temperature at 500 °C.

Original languageEnglish
Pages (from-to)1567-1570
Number of pages4
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume18
Issue number4 II
DOIs
Publication statusPublished - 2000 Jul 1
Event46th National Symposium of the American Vacuum Society - Seatlle, WA, USA
Duration: 1999 Oct 251999 Oct 29

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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