Measurment of incident beam angular dependence of X-ray luminescence intensity and possibility of new atom resolved holography

Kouichi Hayashi, Tetsutaro Hayashi, Toetsu Shishido, Eiichiro Matsubara, Hisao Makino, Takafumi Yao

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

An X-ray excited optical luminescence phenomenon was used for atom resolved X-ray holography. In this study, we measured the incident-beam angular dependence of the X-ray luminescence intensity from a ZnO/MgO/Al 2O3 film. The observed pattern corresponded to the hologram of an Al2O3 substrate, differently from the Zn Kα X-ray fluorescence hologram. This result shows the possibility of the hologram measurement of light elements whose X-ray fluorescence is hardly detectable in air.

Original languageEnglish
Pages (from-to)441-446
Number of pages6
JournalBUNSEKI KAGAKU
Volume55
Issue number6
DOIs
Publication statusPublished - 2006

Keywords

  • Local structure
  • Sapphire
  • X-ray excited optical luminescence
  • X-ray fluorescence holography
  • X-ray luminescence
  • ZnO

ASJC Scopus subject areas

  • Analytical Chemistry

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