Measurement of the taper angle and X-ray reflectivity of MEMS-based silicon mirrors

Tomohiro Ogawa, Yuichiro Ezoe, Teppei Moriyama, Takaya Ohashi, Ikuyuki Mitsuishi, Kazuhisa Mitsuda, Yoshiaki Kanamori, Hitomi Yamaguchi, Raul Riveros

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A taper angle and X-ray reflectivity of MEMS-Based silicon X-ray mirrors is quantitatively measured using a parallel X-ray beam at Al Kα 1.49 keV.

Original languageEnglish
Title of host publicationProceedings - OMN2011
Subtitle of host publication16th International Conference on Optical MEMS and Nanophotonics
Pages167-168
Number of pages2
DOIs
Publication statusPublished - 2011 Dec 12
Event16th International Conference on Optical MEMS and Nanophotonics, OMN2011 - Istanbul, Turkey
Duration: 2011 Aug 82011 Aug 11

Publication series

NameInternational Conference on Optical MEMS and Nanophotonics
ISSN (Print)2160-5033
ISSN (Electronic)2160-5041

Other

Other16th International Conference on Optical MEMS and Nanophotonics, OMN2011
CountryTurkey
CityIstanbul
Period11/8/811/8/11

Keywords

  • DRIE
  • X-ray optics
  • annealing

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials

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  • Cite this

    Ogawa, T., Ezoe, Y., Moriyama, T., Ohashi, T., Mitsuishi, I., Mitsuda, K., Kanamori, Y., Yamaguchi, H., & Riveros, R. (2011). Measurement of the taper angle and X-ray reflectivity of MEMS-based silicon mirrors. In Proceedings - OMN2011: 16th International Conference on Optical MEMS and Nanophotonics (pp. 167-168). [6031068] (International Conference on Optical MEMS and Nanophotonics). https://doi.org/10.1109/OMEMS.2011.6031068