Mathematical design of linear action masks for binary and ternary composition spread film library

Yukio Yamamoto; Ryota Takahashi; Yuji Matsumoto; Toyohiro Chikyow; Hideomi Koinuma

doi:10.1016/j.apsusc.2003.10.025

Mathematical design of linear action masks for binary and ternary composition spread film library

Yukio Yamamoto, Ryota Takahashi, Yuji Matsumoto, Toyohiro Chikyow, Hideomi Koinuma

Research output: Contribution to journal › Article › peer-review

20 Citations (Scopus)

Abstract

The use of variation method for mathematical designing of mask patterns for the composition spread film was discussed. The method designs for concurrent fabrication of binary and ternary phase diagrams in which compositions of each component cover the full range of 0% to 100%. The method selects a geometric figure of the mask pattern and then numerically computes the composition gradient. The method also find its usage for the desired superlattice and devise libraries.

Original language	English
Pages (from-to)	9-13
Number of pages	5
Journal	Applied Surface Science
Volume	223
Issue number	1-3
DOIs	https://doi.org/10.1016/j.apsusc.2003.10.025
Publication status	Published - 2004 Feb 15
Externally published	Yes

Keywords

Combinatorial technology
Composition spread
Ternary phase diagram

ASJC Scopus subject areas

Chemistry(all)
Condensed Matter Physics
Physics and Astronomy(all)
Surfaces and Interfaces
Surfaces, Coatings and Films

Access to Document

10.1016/j.apsusc.2003.10.025

Fingerprint Dive into the research topics of 'Mathematical design of linear action masks for binary and ternary composition spread film library'. Together they form a unique fingerprint.

Cite this

@article{c7292c39b85542dfbc03fd385be4bf1c,

title = "Mathematical design of linear action masks for binary and ternary composition spread film library",

abstract = "The use of variation method for mathematical designing of mask patterns for the composition spread film was discussed. The method designs for concurrent fabrication of binary and ternary phase diagrams in which compositions of each component cover the full range of 0% to 100%. The method selects a geometric figure of the mask pattern and then numerically computes the composition gradient. The method also find its usage for the desired superlattice and devise libraries.",

keywords = "Combinatorial technology, Composition spread, Ternary phase diagram",

author = "Yukio Yamamoto and Ryota Takahashi and Yuji Matsumoto and Toyohiro Chikyow and Hideomi Koinuma",

year = "2004",

month = feb,

day = "15",

doi = "10.1016/j.apsusc.2003.10.025",

language = "English",

volume = "223",

pages = "9--13",

journal = "Applied Surface Science",

issn = "0169-4332",

publisher = "Elsevier",

number = "1-3",

}

TY - JOUR

T1 - Mathematical design of linear action masks for binary and ternary composition spread film library

AU - Yamamoto, Yukio

AU - Takahashi, Ryota

AU - Matsumoto, Yuji

AU - Chikyow, Toyohiro

AU - Koinuma, Hideomi

PY - 2004/2/15

Y1 - 2004/2/15

N2 - The use of variation method for mathematical designing of mask patterns for the composition spread film was discussed. The method designs for concurrent fabrication of binary and ternary phase diagrams in which compositions of each component cover the full range of 0% to 100%. The method selects a geometric figure of the mask pattern and then numerically computes the composition gradient. The method also find its usage for the desired superlattice and devise libraries.

AB - The use of variation method for mathematical designing of mask patterns for the composition spread film was discussed. The method designs for concurrent fabrication of binary and ternary phase diagrams in which compositions of each component cover the full range of 0% to 100%. The method selects a geometric figure of the mask pattern and then numerically computes the composition gradient. The method also find its usage for the desired superlattice and devise libraries.

KW - Combinatorial technology

KW - Composition spread

KW - Ternary phase diagram

UR - http://www.scopus.com/inward/record.url?scp=0347565985&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0347565985&partnerID=8YFLogxK

U2 - 10.1016/j.apsusc.2003.10.025

DO - 10.1016/j.apsusc.2003.10.025

M3 - Article

AN - SCOPUS:0347565985

VL - 223

SP - 9

EP - 13

JO - Applied Surface Science

JF - Applied Surface Science

SN - 0169-4332

IS - 1-3

ER -