Abstract
The use of variation method for mathematical designing of mask patterns for the composition spread film was discussed. The method designs for concurrent fabrication of binary and ternary phase diagrams in which compositions of each component cover the full range of 0% to 100%. The method selects a geometric figure of the mask pattern and then numerically computes the composition gradient. The method also find its usage for the desired superlattice and devise libraries.
Original language | English |
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Pages (from-to) | 9-13 |
Number of pages | 5 |
Journal | Applied Surface Science |
Volume | 223 |
Issue number | 1-3 |
DOIs | |
Publication status | Published - 2004 Feb 15 |
Externally published | Yes |
Keywords
- Combinatorial technology
- Composition spread
- Ternary phase diagram
ASJC Scopus subject areas
- Chemistry(all)
- Condensed Matter Physics
- Physics and Astronomy(all)
- Surfaces and Interfaces
- Surfaces, Coatings and Films