Material stack design with high tolerance to process-induced damage in domain wall motion device

Hiroaki Honjo, Shunsuke Fukami, Kunihiko Ishihara, Keizo Kinoshita, Yukihide Tsuji, Ayuka Morioka, Ryusuke Nebashi, Keiichi Tokutome, Noboru Sakimura, Michio Murahata, Sadahiko Miura, Tadahiko Sugibayashi, Naoki Kasai, Hideo Ohno

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

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Chemical Compounds

Engineering & Materials Science