Mass densification and defect restoration in chemical vapor deposition silicon dioxide film using Ar plasma excited by microwave

Kazumasa Kawase, Tsukasa Motoya, Yasushi Uehara, Akinobu Teramoto, Tomoyuki Suwa, Tadahiro Ohmi

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

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Engineering & Materials Science

Physics & Astronomy

Chemical Compounds