Mass analysis of growth of AL 2O 3 thin films from low-temperature atomic layer deposition on woven cotton

Daisuke Hojo, Tadafumi Adschiri

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)


Atomic layer deposition (ALD) at 100°C provides a conformal coating on woven cotton with a tortuous and complex surfaces. The woven structures are completely preserved and replicated with thin coating of Al 2O 3, even after removing the cotton templates. The replicated woven structures enable direct mass analysis of the cotton coating. Quantitative analysis reveals that the self-limiting reaction of ALD is ensured, even on tortuous cotton surfaces, except for early growth cycles. This unique feature of ALD assures conformal coating onto three-dimensional (3D) networks of cotton. The results demonstrate the possibility of a non-local methodology for evaluating the thickness of a coating on 3D objects at various stages of growth.

Original languageEnglish
Pages (from-to)248-253
Number of pages6
JournalChemical Vapor Deposition
Issue number7-9
Publication statusPublished - 2010 Sep


  • Aluminum oxide
  • Atomic layer deposition
  • Conformal coatings
  • Cotton
  • Three-dimensional structures

ASJC Scopus subject areas

  • Chemistry(all)
  • Surfaces and Interfaces
  • Process Chemistry and Technology


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