Manufacturing process of oxide TFT using Solution-processed photosensitive passivation layer

Makoto Takeshita, Satoru Abe, Takashi Kojiri, Masahiro Hanmura, Tetsuya Goto, Tadahiro Ohmi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

We have developed a Solution-processed Photosensitive Passivation Layer (PPL) for an oxide TFT. We have also developed a manufacturing process for oxide TFT that is suitable for the PPL process. By controlling the oxygen concentration in the oxide semiconductor, we have achieved an oxide TFT with the PPL. This may make it possible to skip the CVD process and to reduce manufacturing costs of LCD panels and OLED.

Original languageEnglish
Title of host publication20th International Display Workshops 2013, IDW 2013
PublisherInternational Display Workshops
Pages489-491
Number of pages3
ISBN (Electronic)9781510827783
Publication statusPublished - 2013 Jan 1
Event20th International Display Workshops 2013, IDW 2013 - Sapporo, Japan
Duration: 2013 Dec 32013 Dec 6

Publication series

NameProceedings of the International Display Workshops
Volume1
ISSN (Print)1883-2490

Other

Other20th International Display Workshops 2013, IDW 2013
CountryJapan
CitySapporo
Period13/12/313/12/6

Keywords

  • A-igzo
  • Oxygen concentration
  • Passivation
  • Photosensitive
  • Solution-process

ASJC Scopus subject areas

  • Computer Vision and Pattern Recognition
  • Human-Computer Interaction
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Radiology Nuclear Medicine and imaging

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