Magnetostriction of Sputtered Sm-Fe Thin Films

T. Honda; Y. Hayashi; K. I. Arai; K. Ishiyama; M. Yamaguchi

doi:10.1109/20.280878

Magnetostriction of Sputtered Sm-Fe Thin Films

T. Honda, Y. Hayashi, K. I. Arai, K. Ishiyama, M. Yamaguchi

Research output: Contribution to journal › Article › peer-review

24 Citations (Scopus)

Abstract

The magnetostriction and the magnetic properties of amorphous Sm_xFe_100-x thin films prepared by sputtering were investigated at room temperature. The magnetostriction, -λ, of these films increased rapidly in low fields (<1kOe) and reached the maximum values of 300-400×10^-6at 16kOe for x=30-40. These results suggest that Sm-Fe thin films could be used for micro-actuators. The magnetic properties of Sm-Fe thin films did not show clear dependence on the sputtering conditions such as input power, Ar gas pressure, and substrate temperature.

Original language	English
Pages (from-to)	3126-3128
Number of pages	3
Journal	IEEE Transactions on Magnetics
Volume	29
Issue number	6
DOIs	https://doi.org/10.1109/20.280878
Publication status	Published - 1993 Nov

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Electrical and Electronic Engineering

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abstract = "The magnetostriction and the magnetic properties of amorphous SmxFe100-x thin films prepared by sputtering were investigated at room temperature. The magnetostriction, -λ, of these films increased rapidly in low fields (<1kOe) and reached the maximum values of 300-400×10-6at 16kOe for x=30-40. These results suggest that Sm-Fe thin films could be used for micro-actuators. The magnetic properties of Sm-Fe thin films did not show clear dependence on the sputtering conditions such as input power, Ar gas pressure, and substrate temperature.",

author = "T. Honda and Y. Hayashi and Arai, {K. I.} and K. Ishiyama and M. Yamaguchi",

year = "1993",

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AU - Honda, T.

AU - Hayashi, Y.

AU - Arai, K. I.

AU - Ishiyama, K.

AU - Yamaguchi, M.

PY - 1993/11

Y1 - 1993/11

N2 - The magnetostriction and the magnetic properties of amorphous SmxFe100-x thin films prepared by sputtering were investigated at room temperature. The magnetostriction, -λ, of these films increased rapidly in low fields (<1kOe) and reached the maximum values of 300-400×10-6at 16kOe for x=30-40. These results suggest that Sm-Fe thin films could be used for micro-actuators. The magnetic properties of Sm-Fe thin films did not show clear dependence on the sputtering conditions such as input power, Ar gas pressure, and substrate temperature.

AB - The magnetostriction and the magnetic properties of amorphous SmxFe100-x thin films prepared by sputtering were investigated at room temperature. The magnetostriction, -λ, of these films increased rapidly in low fields (<1kOe) and reached the maximum values of 300-400×10-6at 16kOe for x=30-40. These results suggest that Sm-Fe thin films could be used for micro-actuators. The magnetic properties of Sm-Fe thin films did not show clear dependence on the sputtering conditions such as input power, Ar gas pressure, and substrate temperature.

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Magnetostriction of Sputtered Sm-Fe Thin Films

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