Magnetostriction of Sm-Fe Thin Films Fabricated by a Sputtering Method

T. Honda, Y. Hayashi, M. Yamaguchi, K. I. Arai

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

The magnetostriction and magnetic properties of sputtered SmxFe100−x (3≤x≤54) thin films at room temperature were investigated. Films had an amorphous structure for x≥12. The magnetostriction λ of the films increased rapidly under weak fields (<1 kOe) and reached maximum values in the range 130 to 160×10−6 at 16 kOe for x=30 to 40, suggesting that Sm-Fe films can be used in microactuators and sensors. The magnetic properties did not show a clear dependence on the sputtering conditions, such as the input power, Ar gas pressure, or substrate temperature (≤250°C).

Original languageEnglish
Pages (from-to)129-133
Number of pages5
JournalIEEE Translation Journal on Magnetics in Japan
Volume9
Issue number1
DOIs
Publication statusPublished - 1994 Jan 1

ASJC Scopus subject areas

  • Engineering (miscellaneous)
  • Engineering(all)

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