Magnetoelectrodeposition for the chiral surface formation of Cu films

I. Mogi, R. Aogaki, R. Morimoto, K. Watanabe

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Citations (Scopus)

Abstract

Cu films were electrodeposited at a constant potential under a magnetic field of 5 T on the Pt disc electrodes with diameters of 3 mm ~ 25 μm. Such magnetoelectrodeposited Cu films were employed as an electrode, and cyclic voltammograms were measured for the electrochemical reactions of the enantiomers of alanine. Chiral behavior was observed in the oxidation currents between the enantiomers. The clear chiral behavior was observed on the micro-disk electrode. The galvanostatic and pulse electrodeposition of the Cu films was also conducted in the magnetic field, and the chiral behavior depended on the pulse width. These results are discussed in connection with the micro- MHD and vertical MHD convections.

Original languageEnglish
Title of host publicationExploiting Magnets in Electrochemistry
Pages1-8
Number of pages8
Edition12
DOIs
Publication statusPublished - 2013
EventSymposium on Exploiting Magnets in Electrochemistry - 221st ECS Meeting - Seattle, WA, United States
Duration: 2012 May 62012 May 10

Publication series

NameECS Transactions
Number12
Volume45
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Other

OtherSymposium on Exploiting Magnets in Electrochemistry - 221st ECS Meeting
CountryUnited States
CitySeattle, WA
Period12/5/612/5/10

ASJC Scopus subject areas

  • Engineering(all)

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