TY - GEN
T1 - Magnetization reversal of deep submicron magnetic elements
AU - Tezuka, N.
AU - Kitagawa, E.
AU - Inomata, K.
AU - Sugimoto, S.
PY - 2002/1/1
Y1 - 2002/1/1
N2 - Magnetic films patterned into deep submicron scale are of great interest with future high density storage and memory devices. These applications require the magnetic behavior, especially switching field, of submicron elements to be well defined. We have calculated the switching field behavior and remanent magnetization configuration for single films and synthetic antiferromagnets (ferromagnet/nonmagnet/ferromagnet:SyAF). In this work, experimental study was carried out using Ni80Fe20 films. We will present these results in conjunction with the results of the micromagnetic simulation and demonstrate the advantage of the SyAF.
AB - Magnetic films patterned into deep submicron scale are of great interest with future high density storage and memory devices. These applications require the magnetic behavior, especially switching field, of submicron elements to be well defined. We have calculated the switching field behavior and remanent magnetization configuration for single films and synthetic antiferromagnets (ferromagnet/nonmagnet/ferromagnet:SyAF). In this work, experimental study was carried out using Ni80Fe20 films. We will present these results in conjunction with the results of the micromagnetic simulation and demonstrate the advantage of the SyAF.
UR - http://www.scopus.com/inward/record.url?scp=85017199198&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85017199198&partnerID=8YFLogxK
U2 - 10.1109/INTMAG.2002.1001209
DO - 10.1109/INTMAG.2002.1001209
M3 - Conference contribution
AN - SCOPUS:85017199198
T3 - INTERMAG Europe 2002 - IEEE International Magnetics Conference
BT - INTERMAG Europe 2002 - IEEE International Magnetics Conference
A2 - Fidler, J.
A2 - Hillebrands, B.
A2 - Ross, C.
A2 - Weller, D.
A2 - Folks, L.
A2 - Hill, E.
A2 - Vazquez Villalabeitia, M.
A2 - Bain, J. A.
A2 - De Boeck, Jo
A2 - Wood, R.
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 2002 IEEE International Magnetics Conference, INTERMAG Europe 2002
Y2 - 28 April 2002 through 2 May 2002
ER -