Magnetization reversal of deep submicron magnetic elements

Nobuki Tezuka, Eiji Kitagawa, Koichiro Inomata, Satoshi Sugimoto

Research output: Contribution to journalConference article

Abstract

The switching field behavior and remanent magnetization configuration for single films and synthetic antiferromagnets were calculated. The samples used in this study were deposited with ion beam sputtering and patterned using electron beam lithography. The results showed that the switching field increased with increasing the aspect ratio because of shape anisotropy.

Original languageEnglish
JournalDigests of the Intermag Conference
Publication statusPublished - 2002 Dec 1
Event2002 IEEE International Magnetics Conference-2002 IEEE INTERMAG - Amsterdam, Netherlands
Duration: 2002 Apr 282002 May 2

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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