Magnetization reversal of deep submicron magnetic elements

Nobuki Tezuka; Eiji Kitagawa; Koichiro Inomata; Satoshi Sugimoto

Magnetization reversal of deep submicron magnetic elements

Nobuki Tezuka, Eiji Kitagawa, Koichiro Inomata, Satoshi Sugimoto

ENG - Materials Science

Research output: Contribution to journal › Conference article › peer-review

Abstract

The switching field behavior and remanent magnetization configuration for single films and synthetic antiferromagnets were calculated. The samples used in this study were deposited with ion beam sputtering and patterned using electron beam lithography. The results showed that the switching field increased with increasing the aspect ratio because of shape anisotropy.

Original language	English
Journal	Digests of the Intermag Conference
Publication status	Published - 2002 Dec 1
Event	2002 IEEE International Magnetics Conference-2002 IEEE INTERMAG - Amsterdam, Netherlands Duration: 2002 Apr 28 → 2002 May 2

ASJC Scopus subject areas

Electrical and Electronic Engineering

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@article{2931bc4c790e4822be68bd4854d98bad,

title = "Magnetization reversal of deep submicron magnetic elements",

abstract = "The switching field behavior and remanent magnetization configuration for single films and synthetic antiferromagnets were calculated. The samples used in this study were deposited with ion beam sputtering and patterned using electron beam lithography. The results showed that the switching field increased with increasing the aspect ratio because of shape anisotropy.",

author = "Nobuki Tezuka and Eiji Kitagawa and Koichiro Inomata and Satoshi Sugimoto",

year = "2002",

month = dec,

day = "1",

language = "English",

journal = "Digests of the Intermag Conference",

issn = "0074-6843",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

note = "2002 IEEE International Magnetics Conference-2002 IEEE INTERMAG ; Conference date: 28-04-2002 Through 02-05-2002",

}

TY - JOUR

T1 - Magnetization reversal of deep submicron magnetic elements

AU - Tezuka, Nobuki

AU - Kitagawa, Eiji

AU - Inomata, Koichiro

AU - Sugimoto, Satoshi

PY - 2002/12/1

Y1 - 2002/12/1

N2 - The switching field behavior and remanent magnetization configuration for single films and synthetic antiferromagnets were calculated. The samples used in this study were deposited with ion beam sputtering and patterned using electron beam lithography. The results showed that the switching field increased with increasing the aspect ratio because of shape anisotropy.

AB - The switching field behavior and remanent magnetization configuration for single films and synthetic antiferromagnets were calculated. The samples used in this study were deposited with ion beam sputtering and patterned using electron beam lithography. The results showed that the switching field increased with increasing the aspect ratio because of shape anisotropy.

UR - http://www.scopus.com/inward/record.url?scp=17944384053&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=17944384053&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:17944384053

JO - Digests of the Intermag Conference

JF - Digests of the Intermag Conference

SN - 0074-6843

T2 - 2002 IEEE International Magnetics Conference-2002 IEEE INTERMAG

Y2 - 28 April 2002 through 2 May 2002

ER -

Magnetization reversal of deep submicron magnetic elements

Abstract

ASJC Scopus subject areas

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