Magnetization and domain patterns in martensitic NiMnGa films on Si(100) wafer

V. A. Chernenko, R. Lopez Anton, S. Besseghini, J. M. Barandiaran, M. Ohtsuka, A. Gambardella, P. Müllner

Research output: Contribution to journalConference articlepeer-review

2 Citations (Scopus)


A series of Ni51.4Mn28.3Ga20.3 films sputter-deposited on Si(100) wafer (with 500 nm thick buffer layer of SiN x) and annealed at 800°C for 1h. are investigated with respect to their transformation behavior and magnetic properties. The film thickness, d, varies from 0.1 to 5.0 μm. Resistivity measurements reveal martensitic transformation above room temperature for all the films except for 0.1 μm-thick film which is transforming at much lower temperature. The magnetic characteristics of martensitic films such as susceptibility and anisotropy field extracted from the in-plane and out-of-plane magnetization curves show film thickness dependence likewise Curie temperature obtained from the resistivity curves. The surface topography and micromagnetic structure are studied by scanning probe microscopy. A stripe magnetic domain pattern featuring a large out-of-plane magnetization component is found in the films. The domain width, δ, depends on the film thickness, d, as δ - √d.

Original languageEnglish
Pages (from-to)35-43
Number of pages9
JournalAdvanced Materials Research
Publication statusPublished - 2008
Externally publishedYes
EventInternational Conference on Ferromagnetic Shape Memory Alloys - Kolkata, India
Duration: 2007 Nov 142007 Nov 16


  • Ferromagnetic shape memory alloys
  • Magnetic domain structure
  • Magnetization
  • NiMnGa/Si(100) thin film composites

ASJC Scopus subject areas

  • Engineering(all)


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