Magnetic properties of ultrathin cobalt films on SiO2 substrates

Shiro Entani; Manabu Kiguchi; Susumu Ikeda; Koichiro Saiki

doi:10.1016/j.tsf.2005.07.310

Magnetic properties of ultrathin cobalt films on SiO₂ substrates

Shiro Entani, Manabu Kiguchi, Susumu Ikeda, Koichiro Saiki

Research output: Contribution to journal › Article › peer-review

14 Citations (Scopus)

Abstract

Thickness dependent magnetism of the ultrathin Co films grown on SiO ₂ substrates was studied by surface magneto-optical Kerr effect in ultrahigh vacuum. The complicated thickness dependence of magnetization, coercive force and magnetic susceptibility was discussed in relation to surface morphology. Existence of 1 monolayer (ML) dead layer originated from partial oxidation at the Co/SiO₂ interface. For the thinner films (∼2 ML), resistance to the magnetic reversal process was large because of larger surface roughness. For thicker films, reduction of the resistance was observed because of formation of continuous and defect less films.

Original language	English
Pages (from-to)	221-225
Number of pages	5
Journal	Thin Solid Films
Volume	493
Issue number	1-2
DOIs	https://doi.org/10.1016/j.tsf.2005.07.310
Publication status	Published - 2005 Dec 22
Externally published	Yes

Keywords

Cobalt
Magnetic properties and measurements
SMOKE
Surface morphology

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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title = "Magnetic properties of ultrathin cobalt films on SiO2 substrates",

abstract = "Thickness dependent magnetism of the ultrathin Co films grown on SiO 2 substrates was studied by surface magneto-optical Kerr effect in ultrahigh vacuum. The complicated thickness dependence of magnetization, coercive force and magnetic susceptibility was discussed in relation to surface morphology. Existence of 1 monolayer (ML) dead layer originated from partial oxidation at the Co/SiO2 interface. For the thinner films (∼2 ML), resistance to the magnetic reversal process was large because of larger surface roughness. For thicker films, reduction of the resistance was observed because of formation of continuous and defect less films.",

keywords = "Cobalt, Magnetic properties and measurements, SMOKE, Surface morphology",

author = "Shiro Entani and Manabu Kiguchi and Susumu Ikeda and Koichiro Saiki",

note = "Funding Information: The authors would like to thank Prof. F. Komori (Institute for Solid State Physics, The University of Tokyo) for his kind help in setting up SMOKE system. This work was supported by a Grant-in-Aid from the Ministry of Education, Culture, Sports, Science and Technology of Japan (14GS0207).",

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T1 - Magnetic properties of ultrathin cobalt films on SiO2 substrates

AU - Entani, Shiro

AU - Kiguchi, Manabu

AU - Ikeda, Susumu

AU - Saiki, Koichiro

N1 - Funding Information: The authors would like to thank Prof. F. Komori (Institute for Solid State Physics, The University of Tokyo) for his kind help in setting up SMOKE system. This work was supported by a Grant-in-Aid from the Ministry of Education, Culture, Sports, Science and Technology of Japan (14GS0207).

PY - 2005/12/22

Y1 - 2005/12/22

N2 - Thickness dependent magnetism of the ultrathin Co films grown on SiO 2 substrates was studied by surface magneto-optical Kerr effect in ultrahigh vacuum. The complicated thickness dependence of magnetization, coercive force and magnetic susceptibility was discussed in relation to surface morphology. Existence of 1 monolayer (ML) dead layer originated from partial oxidation at the Co/SiO2 interface. For the thinner films (∼2 ML), resistance to the magnetic reversal process was large because of larger surface roughness. For thicker films, reduction of the resistance was observed because of formation of continuous and defect less films.

AB - Thickness dependent magnetism of the ultrathin Co films grown on SiO 2 substrates was studied by surface magneto-optical Kerr effect in ultrahigh vacuum. The complicated thickness dependence of magnetization, coercive force and magnetic susceptibility was discussed in relation to surface morphology. Existence of 1 monolayer (ML) dead layer originated from partial oxidation at the Co/SiO2 interface. For the thinner films (∼2 ML), resistance to the magnetic reversal process was large because of larger surface roughness. For thicker films, reduction of the resistance was observed because of formation of continuous and defect less films.

KW - Cobalt

KW - Magnetic properties and measurements

KW - SMOKE

KW - Surface morphology

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