Magnetic properties of rutile Ti1-xFexO2 epitaxial thin films

Kazuhisa Inaba, Taro Hitosugi, Yasushi Hirose, Yutaka Furubayashi, Go Kinoda, Yukio Yamamoto, Tae Won Kim, Hiroshi Fujioka, Toshihiro Shimada, Tetsuya Hasegawa

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    12 Citations (Scopus)

    Abstract

    Growth conditions for pulsed laser deposition of ferromagnetic Ti 1-xFexO2 films with the rutile structure have been optimized on the basis of magnetooptical Kerr effect (MOKE) measurements. Thus, it was found that Ti0.94Fe0.06O2 films prepared under very limited growth conditions, at a substrate temperature of 650-675°C and an oxygen pressure of ∼1 × 10-6Torr, show ferromagnetism at room temperature. The optimized films revealed a saturation magnetization of 1.3 μB and a coercive field of 0.14kOe. From XPS measurements, the valence state of Fe was determined to be 3+, ruling out the possibility that ferromagnetism may arise from Fe3O4 nanoparticles.

    Original languageEnglish
    Pages (from-to)L114-L116
    JournalJapanese Journal of Applied Physics, Part 2: Letters
    Volume45
    Issue number4-7
    DOIs
    Publication statusPublished - 2006 Feb 3

    Keywords

    • Diluted magnetic semiconductor
    • Fe-doped
    • Ferromagnetism
    • Rutile
    • TiO

    ASJC Scopus subject areas

    • Engineering(all)
    • Physics and Astronomy (miscellaneous)
    • Physics and Astronomy(all)

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  • Cite this

    Inaba, K., Hitosugi, T., Hirose, Y., Furubayashi, Y., Kinoda, G., Yamamoto, Y., Kim, T. W., Fujioka, H., Shimada, T., & Hasegawa, T. (2006). Magnetic properties of rutile Ti1-xFexO2 epitaxial thin films. Japanese Journal of Applied Physics, Part 2: Letters, 45(4-7), L114-L116. https://doi.org/10.1143/JJAP.45.L114