Magnetic Properties of Fe-Si Thin Films Sputtered in Mixed Gas Atmospheres

K. I. Arai, M. Yamaguchi, Y. Hayashi, K. Murakami

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Abstract

An examination was made of magnetic properties and the crystal structure of Fe-Si thin films prepared by a sputtering technique with air or oxygen added to the argon gas atmosphere. The coercive force of the film deposited in air plus argon gas decreased down to 1/5 value as compared with the film deposited in pure argon gas. In this case the crystal orientation changed and the grain size became smaller. The coercive force of the films deposited in oxygen added argon gas atmosphere also decreased down to the same value as that of the air addition case. Accordingly the initial permeability increased. It is thought that these changes of the magnetic properties were caused by oxidation of silicon in the films.

Original languageEnglish
Pages (from-to)3976-3978
Number of pages3
JournalIEEE Transactions on Magnetics
Volume25
Issue number5
DOIs
Publication statusPublished - 1989 Sep

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

Fingerprint

Dive into the research topics of 'Magnetic Properties of Fe-Si Thin Films Sputtered in Mixed Gas Atmospheres'. Together they form a unique fingerprint.

Cite this