Results of an investigation into the relation between the differences in Fe-Si film structure governing its soft magnetic properties and its film magnetic properties is discussed. The absolute values of coercivity (H//c showed extreme variation with different growth conditions. The composition for which H//c was minimal was 7-8 wt% Si at 3. 5 kV. At 2. 0 kV it was displaced to the high-Si-content side. In-plane anisotropy was independent of film growth conditions, and it was found that the films had strong uniaxial anisotropy of 1 multiplied by 10**4 erg/cc. This fact implies that Fe-Si-system sputtered-film soft magnetic properties are strongly governed by magnetostriction.
|Number of pages||3|
|Journal||IEEE translation journal on magnetics in Japan|
|Publication status||Published - 1985 Mar|
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