Magnetic and electrical properties of NiFe-oxide mixture films

Koichi Nishioka, Katsuya Mitsuoka, Hiroshi Fukui, Shinji Narishige, Moriaki Fuyama

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)

Abstract

In order to improve the performance of Magnetoresistive heads, higher saturation flux density Bs and higher resistivity p are preferable for Soft Adjacent Layer (SAL). NiFe-oxide (oxide= SiO2, Al2O3, ZrO2 and Ta2O5) mixture films were investigated for SAL. Among these films, NiFe-ZrO2 system is preferable because of its high Bs ρ value and low coercivity. The stability of the NiFe-ZrO2 system at 250°C was also investigated, which shows that Bs and ρ change by annealing and the changes are larger as ZrO2 content is larger. As for an application, MR devices which have 3.2 µm width and 2.8 µm height were fabricated and transfer curves were measured. The maximum output voltage of the device in which NiFe-12mol% ZrO2 was employed was 23% larger than the calculated value for the decice in which NiFe-Nb (Bs ρ=60 Tesla µΩcm) was assumed to be employed.

Original languageEnglish
Pages (from-to)2633-2635
Number of pages3
JournalIEEE Transactions on Magnetics
Volume31
Issue number6
DOIs
Publication statusPublished - 1995 Nov
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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