Low-temperature, uniform, and high-density plasma produced by a new ultra-high-frequency discharge with a spokewise antenna

Seiji Samukawa, Yukito Nakagawa, Tsutomu Tsukada, Hiroyuki Ueyama, Kibatsu Shinohara

Research output: Contribution to journalArticlepeer-review

39 Citations (Scopus)

Abstract

A low-temperature, uniform, high-density plasma is produced by an ultra-high-frequency (UHF) discharge with a new spokewise antenna. The plasma is uniform within ±5% over a diameter of 20 cm. The plasma density, 5×1010cm-3 for low-electron temperatures of 1.5-2.0 eV, is almost proportional to the UHF power even at a low-UHF power of 100 W. No magnetic field is needed to maintain a high-density plasma. Consequently, the plasma source is fairly simple and lightweight. The plasma source should ease serious problems in etching processes that use conventional high-density plasmas.

Original languageEnglish
Number of pages1
JournalApplied Physics Letters
Volume67
DOIs
Publication statusPublished - 1995 Dec 1
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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