Low-temperature Si/Si1-xGex/Si heterostructure growth at high Ge fractions by low-pressure chemical vapor deposition

Reiner Schütz, Junichi Murota, Takahiro Maeda, Roland Kircher, Kuniyoshi Yokoo, Shoichi Ono

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8 Citations (Scopus)


The growth of a Si/Si1-xGex/Si heterostructure at high Ge fractions was investigated by an ultraclean low-pressure chemical vapor deposition using SiH4 and GeH4 gases in the temperature range of 450-650°C. It was found that a lowering of the deposition temperatures of the Si1-xGex and Si capping layers is necessary with the increasing Ge fraction in order to prevent island growth of the layer during deposition. For a Ge fraction around 0.2, atomically flat surfaces and interfaces can be obtained by depositing Si1-xGe x and Si capping layers at 550°C. For higher Ge fractions, even much lower deposition temperatures are suitable, namely 450°C for a Si 0.3Ge0.7 layer and 500°C for a Si0.5Ge 0.5 layer, respectively, with a Si capping layer deposited at temperatures of 550°C or less. Nevertheless, the degradation of the Si 0.3Ge0.7 layer with the capping layer was not observed even after a wet oxidation at 700°C.

Original languageEnglish
Pages (from-to)2674-2676
Number of pages3
JournalApplied Physics Letters
Issue number22
Publication statusPublished - 1992 Dec 1

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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