Low temperature preparation of KNbO3 films by hydrothermal method and their characterization

N. Kaneko, T. Shiraishi, M. Kurosawa, T. Shimizu, H. Funakubo

Research output: Contribution to journalConference articlepeer-review

1 Citation (Scopus)

Abstract

KNbO3 films were prepared at 100 - 240°C on (100)cSrRuO3//(100)SrTiO3 substrates by hydrothermal method using KOH and Nb2O5 as source materials. The incubation time before starting deposition and the deposition rate after starting deposition increased and decreased with decreasing deposition temperature, respectively. Epitaxial {100}c-oriented KNbO3 films with 300 nm thick were successfully obtained at 100°C on (100)cSrRuO3//(100)SrTiO3 substrates for 144 h. We observed the typical butterfly-shape strain curves originated from the piezoelectricity for the first time for KNbO3 films deposited down to 120°C.

Original languageEnglish
JournalMaterials Research Society Symposium Proceedings
Volume1659
DOIs
Publication statusPublished - 2014 Jan 1
Externally publishedYes
Event2013 MRS Fall Meeting - Boston, MA, United States
Duration: 2013 Dec 12013 Dec 6

Keywords

  • epitaxy
  • hydrothermal
  • piezoelectric

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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