Low-temperature preparation of high-n TiO 2 thin film on glass by pulsed laser deposition

Akihiro Ishii, Yoko Nakamura, Itaru Oikawa, Atsunori Kamegawa, Hitoshi Takamura

Research output: Contribution to journalArticlepeer-review

23 Citations (Scopus)

Abstract

Single-phase rutile-type TiO 2 thin films with a high refractive index (n) and a low extinction coefficient (k) prepared on glass are expected to improve the performance of anti-reflection coatings. In this study, TiO 2 thin films were prepared by the pulsed laser deposition (PLD) method at temperatures ranging from room temperature to 600 °C under an oxygen partial pressure of 1-9 Pa or a 10 -5 Pa vacuum, and their crystal structure, microstructure and optical properties were investigated. A single-phase rutile-type TiO 2 thin film was successfully prepared on a glass substrate by depositing at room temperature in a vacuum followed by post-annealing at 450 °C in air. A nanocrystalline oxygen-deficient phase in the as-deposited films plays an important role in the formation of the single rutile phase during post-annealing. The single-phase rutile-type TiO 2 thin films showed excellent optical properties, with n = 3.14 and k < 0.05 at λ = 400 nm.

Original languageEnglish
Pages (from-to)528-534
Number of pages7
JournalApplied Surface Science
Volume347
DOIs
Publication statusPublished - 2015

Keywords

  • AR coating
  • PLD
  • Rutile
  • TiO thin film

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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