Low-temperature formation of silicon nitride films using pulsed-plasma CVD under near atmospheric pressure

M. Matsumoto, Y. Inayoshi, M. Suemitsu, E. Miyamoto, T. Yara, S. Nakajima, T. Uehara, Y. Toyoshima

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Fingerprint Dive into the research topics of 'Low-temperature formation of silicon nitride films using pulsed-plasma CVD under near atmospheric pressure'. Together they form a unique fingerprint.

Chemical Compounds

Engineering & Materials Science

Physics & Astronomy