Low-temperature fabrication of transparent conducting polycrystalline Nb-doped TiO2 films by sputtering

N. L.H. Hoang, N. Yamada, T. Hitosugi, J. Kasai, S. Nakao, T. Shimada, T. Hasegawa

    Research output: Chapter in Book/Report/Conference proceedingConference contribution


    This paper presents a low-temperature (≃300°C) process for preparing transparent conducting anatase Nb-doped TiO2 (TNO) films on glass by sputtering. An amorphous film composed of an oxygen-rich bottom layer and oxygen-deficient top layer was deposited at room temperature. This film was then annealed in a reducing atmosphere in order to crystallize anatase. The oxygen-rich bottom layer behaved as a seed layer during crystallization of the top layer, resulting in lower crystallization temperature and significant improvement in crystallinity. The TNO polycrystalline films obtained by post-deposition annealing at 400°C exhibited resistivity of 6.4 × 10-4 Ω cm and absorption of less than 10% in the visible region. The low-temperature process developed here was applied to fabrication of TNO films on plastics and glass with low glass-transition temperature.

    Original languageEnglish
    Title of host publicationTransparent Conductors and Semiconductors for Optoelectronics
    Number of pages6
    Publication statusPublished - 2009
    Event2009 MRS Fall Meeting - Boston, MA, United States
    Duration: 2009 Nov 302009 Dec 4

    Publication series

    NameMaterials Research Society Symposium Proceedings
    ISSN (Print)0272-9172


    Other2009 MRS Fall Meeting
    Country/TerritoryUnited States
    CityBoston, MA

    ASJC Scopus subject areas

    • Materials Science(all)
    • Condensed Matter Physics
    • Mechanics of Materials
    • Mechanical Engineering


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