Low-temperature fabrication of transparent conducting anatase Nb-doped TiO2 films by sputtering

Ngoc Lam Huong Hoang, Naoomi Yamada, Taro Hitosugi, Junpei Kasai, Shoichiro Nakao, Toshihiro Shimada, Tetsuya Hasegawa

    Research output: Contribution to journalArticlepeer-review

    36 Citations (Scopus)


    We present a low-temperature (∼300°C) process for preparing transparent conducting anatase Nb-doped TiO2 (TNO) polycrystalline films by sputtering. We first deposited amorphous films composed of an oxygen-rich bottom layer and oxygen-deficient top layer at room temperature. These films were then crystallized in a reducing atmosphere. The oxygen-rich bottom layer behaved as a seed layer during crystallization of the top layer, resulting in significant improvement of crystallinity and reduction of crystallization temperature. We obtained TNO polycrystalline films showing a resistivity of 6.4 × 10 -4 Ω cm and absorption below 10% In the visible region by post-deposition annealing at 400°C. The developed low-temperature process was applied to fabricating TNO films on plastics and glass with low glass-transition temperature.

    Original languageEnglish
    Pages (from-to)1150011-1150013
    Number of pages3
    JournalApplied Physics Express
    Issue number11
    Publication statusPublished - 2008 Nov

    ASJC Scopus subject areas

    • Engineering(all)
    • Physics and Astronomy(all)


    Dive into the research topics of 'Low-temperature fabrication of transparent conducting anatase Nb-doped TiO2 films by sputtering'. Together they form a unique fingerprint.

    Cite this